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| Determination of 44 Ultratrace Elements in High-purity Argon in the Electronic Industry by Gas Absorption-Inductively Coupled Plasma Triple Quadrupole Mass Spectrometry (ICP-MS/MS) |
| Received:September 18, 2023 Revised:May 27, 2024 |
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| DOI：10.3969/j.issn.2095-1035.2024.07.013 |
| KeyWord:Electronic special gas; Ultratrace elements; ICP-MS/MS; Gas absorption; Interference cancellation |
| Author | Institution |
| Chen Tingting |
杭州谱育科技发展有限公司 |
| Li Ying |
杭州谱育科技发展有限公司 |
| Xu Yue |
杭州谱育科技发展有限公司 |
| Yu Xiaofeng |
杭州谱育科技发展有限公司 |
| Wu Zhiwei |
杭州谱育科技发展有限公司 |
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| Abstract: |
| With the increasing requirements of the electronic industry for the purity of special gases, in order to achieve lower detection limits, a gas absorption device has been optimized and designed based on the national standard. A method for simultaneously determining the content of 44 elements in special gases has been established using inductively coupled plasma triple quadrupole mass spectrometry (ICP-MS/MS) technology. The ultra trace impurity elements in high-purity argon can be completely absorbed into a 5% nitric acid absorption solution by the optimized gas absorption device. The absorption solution can be directly analyzed by ICP-MS/MS, and various analysis modes such as Std、He、NH3、Cool、Cool NH3, etc. are used to effectively eliminate the multiple types of mass spectrometry interferences (polyatomic ions, double charges, isotopes, etc.) suffered by the target elements. Under optimized experimental conditions, with a sampling volume of 89.4L, the detection limit range of 44 ultra trace impurity elements in high-purity argon gas is 0.00002ng/L~0.0026ng/L, which is 1 to 4 orders of magnitude lower than the detection limit range specified in the national standard (GB/T 34972-2017). All target elements can obtain a correlation coefficient of the standard curve greater than 0.999, with a recovery rate of 93.1% (Cu)~118% (Na) and a relative standard deviation of 0.68% (Cs)~14% (Zn). The optimized gas absorption device has the characteristics of portability, high efficiency, diverse functions, and pollution isolation. It is combined with ICP-MS/MS to achieve stable and reliable testing of ultra-trace impurity elements in high-purity argon gas. It can provide technical support for the quality control of industrial product raw materials with high requirements for gas purity, such as semiconductors and high-purity materials. |
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